Growth and characterization of nanoscale 3C–SiC islands on Si substrates

Abstract

Three-dimensional nanoscale SiC islands were grown directly on to (111) crystalline Si substrates by reaction with hydrogen-plasma-containing Si and C radicals at temperatures between 650 and 900 °C. X-ray diffraction and transmission electron microscopy observations show that the islands are composed of (111)-oriented cubic SiC (3C–SiC) grains. Nucleation of the islands took place at conical projections on the Si substrate surface produced by hydrogen plasma etching. At the highest substrate temperatures the diameter and density of the islands were smallest, while their height was greatest and their structure most disordered.