Abstract
Cuprous oxide and copper thin films were potentiostatically electro-deposited over indium-tin oxide (ITO) coated glass substrate with two different aqueous electrolytes: 0.1 M KNO3 solution in comparison with the 0.05 M CH3COOH/CH3COONa (pH=5.7) solution. Cyclic voltammetry (CV) was used to determine the optimal deposition potentials. A single pair redox peaks were observed in the CV for 0.05 M CuSO4 in the buffer solution, while two redox couples were observed in the KNO3 solution. X-ray diffraction (XRD) and X-ray photo spectroscopy (XPS) revealed that in the buffer electrolyte the deposition for Cu2O, Cu and co-deposition alloy were formed at more negative potentials than in the KNO3. Furthermore, periodic structure can be obtained by controlling the deposition potentials in KNO3 with CuSO4 solution. The structural and morphological properties of the films have been investigated by means of scanning electron microscopy (SEM) and atomic force microscopy (AFM).
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