Abstract
Block copolymer nanolithography has attracted enormous interest in chip technologies, such as integrated silicon chips and biochips, due to its large-scale and mass production of uniform patterns. We further modified this technology to grow embossed nanodots, nanorods, and nanofingerprints of polymer brushes on silicon from their corresponding wet-etched nanostructures covered with pendent SiHx (X = 1–3) species. Atomic force microscopy (AFM) was used to image the topomorphologies, and multiple transmission-reflection infrared spectroscopy (MTR-IR) was used to monitor the surface molecular films in each step for the sequential stepwise reactions. In addition, two layers of polymethacrylic acid (PMAA) brush nanodots were observed, which were attributed to the circumferential convergence growth and the diffusion-limited growth of the polymer brushes. The pH response of PMAA nanodots in the same region was investigated by AFM from pH 3.0 to 9.0.
Highlights
One of the key achievements for many future applications of nanostructures is to precisely pattern nanoscale features on technologically relevant semiconductor surfaces, such as silicon and germanium, to improve the chip performance and invent new technologies whereas continuing to reduce the chip size
Block copolymer lithography with wet etching offers an advantage for the mass and very-large-scale production of chips in a general chemistry laboratory at minimal expense and with easy handling
We successfully grew embossed nanodots, nanorods, and nanofingerprints of polymethacrylic acid (PMAA) brushes on silicon from their corresponding templated nanostructures with pendent SiHx species, which were wet-etched from block copolymers
Summary
One of the key achievements for many future applications of nanostructures is to precisely pattern nanoscale features on technologically relevant semiconductor surfaces, such as silicon and germanium, to improve the chip performance and invent new technologies whereas continuing to reduce the chip size. An alternative approach by wet etching platinum (Pt) dotted nanofingerprints derived from PS-b-P2VP nanofingerprints[9,10], followed by surface hydrosilylation and SI-ATRP provided satisfactory embossed nanofingerprints of polymer brushes.
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
