Ground fused silica processed by combined chemical etching and CO2 laser polishing with super-smooth surface and high damage resistance.

Abstract

Laser damage in fused silica, particularly ultraviolet laser damage, is still a key problem limiting the development of high-power laser systems. In this Letter, a combined process of chemical etching and CO2 laser polishing was applied to ground fused silica. A super-smooth surface with a root-mean-square roughness of 0.25 nm was achieved through this combined process. Furthermore, the combined process can reduce the introduction of photoactive metal impurity elements, destructive defects, and chemical-structure defects, resulting in a 0% probability damage threshold nearly 33% higher than a conventional chemical mechanical polished sample for a 7.6 ns pulse at a wavelength of 355 nm.