Abstract

Finite difference time-domain (FDTD) analysis is used to investigate the light absorption enhancement factor dependence on the groove shape of the nano-gratings etched into the surfaces of metal-semiconductor-metal photodetector (MSM-PD) structures. By patterning the MSM-PDs with optimized nano-gratings a significant improvement in light absorption near the design wavelength is achieved through plasmon-assisted electric field concentration effects. Simulation results show about 50 times light absorption enhancement for 850 nm light due to improved optical signal propagation through the nano-gratings.

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