Grazing incidence fast atom diffraction in high-pressure conditions

Abstract

Grazing Incidence Fast Atom Diffraction (GIFAD) is a recent technique for characterizing surface structures and real-time monitoring of thin film growth. Up to now, GIFAD has only been used in Ultra-High-Vacuum conditions, typically in the range of 10−10 to 10−8 mbar, and has therefore only been considered for high vacuum deposition methods like Molecular Beam Epitaxy or very low-pressure Chemical Vapor Deposition (CVD). At pressures exceeding 10−6 mbar, gas phase collisions along the atom beam trajectory not only reduce the mean free path but also degrade the beam coherence length and thus potentially suppress the diffraction signal. In addition, pressures lower than 10−5 mbar are required to maintain a low noise level on the scattered particle detector. In a new configuration, we demonstrate that GIFAD can operate at pressure as high as 10−2 mbar of argon with well-contrasted diffraction patterns. This opens wide avenues for the study of surface reactivity, thin film growth in Magnetron Sputtering Deposition, where electron diffraction is inevitably perturbed by the electromagnetic fields. This High-Pressure version of GIFAD could also be extended to Reactive Pulsed Laser Deposition and many CVD variants.