Abstract
This article reports on the development of a novel grayscale photomask which operates on the basis of differential absorption of ultraviolet (UV) light in photoabsorbing material. The developed photomask is made of a patterned, moldable polymer (polydimethylsiloxane) doped with a laser dye (Coumarin 314). The doped polymer functions as photoabsorbing material. Due to the moldable nature of polydimethylsiloxane, micro- and nanostructures can be created on its surface from a complementary mold relief. By adjusting the thickness of patterns formed on the photomask, concentration of the dye in the polymer, and UV exposure dose, a multitude of unique multidimensional microstructures can be fabricated with desired geometries and dimensions. Using the developed polymer photomask with a standard UV source, three-dimensional microstructures with different heights have been formed in positive photoresist by a single UV exposure step. This method is inexpensive compared to other grayscale lithography techniques and relatively easy to implement due to its process simplicity.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
More From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.