Abstract
Graphoepitaxy of Pt films on sawtooth profile gratings is realized. Gratings with 0.4 μm period are fabricated in (100)Si wafers using laser holographic lithography and Si anisotropic etching. Pt films evaporated at 200 °C on the gratings and annealed at 800 °C have (100) planes parallel to the substrate. From scanning electron micrograph it is found that the 100-nm-thick Pt film consists of crystallites embedded in the gratings. The grain size is about one grating period wide and 0.5–5 μm long. Continuous films with (100) orientation are produced after further deposition and annealing.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
