Graphoepitaxy of platinum on sawtooth profile gratings

Abstract

Graphoepitaxy of Pt films on sawtooth profile gratings is realized. Gratings with 0.4 μm period are fabricated in (100)Si wafers using laser holographic lithography and Si anisotropic etching. Pt films evaporated at 200 °C on the gratings and annealed at 800 °C have (100) planes parallel to the substrate. From scanning electron micrograph it is found that the 100-nm-thick Pt film consists of crystallites embedded in the gratings. The grain size is about one grating period wide and 0.5–5 μm long. Continuous films with (100) orientation are produced after further deposition and annealing.