Abstract
The graphoepitaxy of platinum on sawtooth profile gratings was investigated as a means of fabricating (100) oriented Pt films on Si substrates. Successful alignment was achieved using electron beam evaporated Pt layers on substrates with pitches of 0.20, 0.24, 0.27, and 0.30 μm. In order to achieve smooth, well-oriented layers, the alignment and microstructures of these films were studied as a function of annealing time and temperature. The degree of graphoepitaxial alignment achieved was found to depend on the stabilization and growth of (100) grains before extensive mass motion of Pt was permitted. Remanent (111) grains could then be reoriented through mass motion and assimilation into growing (100) grains. An annealing profile fulfilling these requirements for a 700 Å thick evaporated film is presented.
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