Abstract
Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C–N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C 3N 4 was obtained.
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