Abstract

A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly bias- and temperature-dependent reverse current. Below room temperature, the reverse current grows exponentially with the applied voltage because the pillar-enhanced electric field lowers the Schottky barrier. Conversely, at higher temperatures, the charge carrier thermal generation is dominant and the reverse current becomes weakly bias-dependent. A quasi-saturated reverse current is similarly observed at room temperature when the charge carriers are photogenerated under light exposure. The device shows photovoltaic effect with 0.7% power conversion efficiency and achieves 88 A/W photoresponsivity when used as photodetector.

Highlights

  • The discovery of two-dimensional (2D) materials such as graphene [1], MoS2 [2,3], WSe2 [4,5], phosphorene and so on [6], has attracted the interests of the scientific community in the recent years

  • A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate

  • Large graphene layers can be synthesized by chemical vapor deposition (CVD) and integrated into the existing semiconductor device technologies

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Summary

Introduction

The discovery of two-dimensional (2D) materials such as graphene [1], MoS2 [2,3], WSe2 [4,5], phosphorene and so on [6], has attracted the interests of the scientific community in the recent years. Abstract: A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly biasand temperature-dependent reverse current.

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