Graphene-like metal-on-silicon field-effect transistor

Abstract

This paper presents a field-effect transistor with a channel consisting of a two-dimensional electron gas located at the interface between an ultrathin metallic film of Ni and a p-type Si(111) substrate. The gate length is L = 2 μm, its width is W = 180 μm, and the source–drain separation is 188 μm, the role of the gate dielectric being played by the surface states of the ultrathin metal layer. We have demonstrated that the two-dimensional electron gas channel is modulated by the gate voltage. The dependence of the drain current on the drain voltage has no saturation region, similar to a field-effect transistor based on graphene. The drain current is 2 mA at a drain voltage of 3 V and a gate voltage of 1.07 V, while the transconductance is 0.6 mS for a drain voltage of 6 V and a gate voltage of 1 V. However, the transport in this transistor is not ambipolar, as in graphene, but unipolar.