Abstract
In this work, the field distribution in structures such as a gold grating, a graphene layer, and a silicon substrate was studied. The conditions for maximum electromagnetic field distribution (absorption) by this structure to use in photonics and electronics devices were established. The magnitude of the electromagnetic field of a gold diffraction grating with a graphene layer increases with decreasing slit width. At the same time, an increase in the period leads to small changes in the electromagnetic field distribution. The maximum value of the distribution of the electromagnetic field is increased significantly, almost twice reducing the thickness of the graphene layer.
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