Abstract

Doping of a foreign element in sp2 hybridized graphene lattice is of significant importance to tune the electrical and chemical properties. Here, we report on the grain structures of substitutional nitrogen-doped graphene synthesized by an atmospheric pressure (AP) solid source-based chemical vapor deposition (CVD) technique. Nitrogen-doped graphene was synthesized by mixing solid camphor and melamine as carbon and nitrogen source, respectively. The precursor materials quantity significantly affects the graphene growth on Cu foil and thereby the nitrogen doping and content. Transmission electron microscopy (TEM) analysis was performed to determine the nitrogen substitutional sites in the graphene. Dark-field (DF) TEM analysis was carried out to evaluate the graphene grain structure grown with introduction of nitrogen dopant. We obtained different grain orientations, where an individual grain size is more than 5 μm. Our findings show that graphitic nitrogen defects can be introduced in the large individual graphene grain by the developed solid source-based CVD technique.

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