Gradual pressure release for reliable nanoimprint lithography

Abstract

Reliable generation of nanometer-scale features is one of the most critical subjects for the industrial use of nanoimprint lithography. In this brief report, the authors investigate the influence of imprinting pressure history on the fidelity of a molded pattern in thermal nanoimprint lithography. The authors demonstrate that the morphology of molded patterns can be drastically improved by altering the pressure applied during the cooling step. A gradual release of imprinting pressure is found to augment reliable pattern transfer of high-density nanodot arrays without any noticeable polymer reflow or delamination of the patterned layer.