Abstract
Chemical vapor deposition of coatings (MO CVD) using volatile organometallic compounds is considered. The results of the analysis of coating parameters by X-ray diffraction methods, microscopic visualization and differential dissolution confirm the possibility of controlling the composition and structure of the coatings by varying the parameters of the deposition process. The obtained data laid the foundations for the physicochemical process of forming thermal coatings with given functional characteristics.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
