Abstract

Short-wavelength-infrared (SWIR; 1.4--3.0 \textmu{}m) photodetection is important for various applications. Inducing a low-cost silicon-compatible material, such as germanium, to detect SWIR light would be advantageous for SWIR applications compared with using conventional (III-V or II-VI) SWIR materials. Here, we present a scalable nonequilibrium method for hyperdoping germanium with gold for dopant-mediated SWIR photodetection. Using ion implantation followed by nanosecond pulsed laser melting, we obtain a single-crystal material with a peak gold concentration of 3 \ifmmode\times\else\texttimes\fi{} ${10}^{19}\phantom{\rule{0.1em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$ $({10}^{3}$ times the solubility limit). This hyperdoped germanium has fundamentally different optoelectronic properties from those of intrinsic and conventionally doped germanium. This material exhibits sub-band-gap absorption of light up to wavelengths of at least 3 \textmu{}m, with a sub-band-gap optical absorption coefficient comparable to that of commercial SWIR photodetection materials. We show that germanium hyperdoped with gold exhibits sub-band-gap SWIR photodetection at room temperature, in contrast with previous doped-germanium photodetector studies, which only show a low-temperature response. This material is a potential pathway to low-cost room-temperature silicon-compatible SWIR photodetection.

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