Abstract
Complex materials have unique thermal and electron transport properties. In this work, a novel catalyst-assisted metal organic chemical vapor deposition approach was employed to make Bi-Te-Ni-Cu-Au complex materials on an anodic aluminum oxide nanoporous substrate. Nickel acetate, copper nitrate, bismuth acetate, and tellurium (IV) chloride dissolved in N,N-dimethylformamide (DMF) were used as the metal sources for Ni, Bi, Cu, and Te, respectively. Hydrogen was used as the carrier gas. The anodic aluminum oxide substrate sputter-coated on a thin gold coating and was kept at 500 °C in a quartz tube in the reaction chamber. The chemical vapor deposition time was two hours. Scanning electron microscopy was used to reveal the morphology of the deposited materials. Due to metal catalyst assisted growth, the Bi-Te-Ni-Cu-Au materials were self-assembled into islands distributed fairly uniformly on the substrate. The mechanism for the morphological development of the materials was investigated. It was found that the Au nanoparticles facilitated the formation of the complex Bi-Te-Al-Ni-Cu materials. The prepared nanostructure has the highest absolute Seekbeck coefficient value of 260 µV/K, which is more than twice the value obtained from the bulk material.
Highlights
Chemical vapor deposition (CVD) has been considered as a standard industrial coating technique since the 1970s
The anodic aluminum oxide (AAO) template used in the experiment was purchased from
The microstructure of the anodic aluminum oxide was characterized by various imaging and microstructure anodic aluminum oxide wasAAO
Summary
Chemical vapor deposition (CVD) has been considered as a standard industrial coating technique since the 1970s. During the last two decades, it was used effectively for making micro or nanoscale materials. CVD was proposed to prepare low-dimensional thermoelectric materials [1] for several reasons. A high deposition rate was achieved to deposit n-type coating on sapphire substrate under a low pressure [2]. Another feature of CVD is that the structures of deposited materials may be enhanced by pre-patterned metal dot catalysts [3,4]
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