GMR in Excess of 10% at Room Temperature and Low Magnetic Fields in Electrodeposited Cu/Co Nano-multilayer Structures

Abstract

ABSTRACTElectrodeposition has emerged as a novel economically viable technique with large-scale production capabilities in modern day micro technologies. The current trends are to extend the potential of the electrodeposition to nano fabrication. We have successfully electrodeposited Cu/Co multilayers, exhibiting appreciably high GMR, on ITO as well as on Cu/Si substrates. Multilayer stacks with films in thickness range 1 – 10 nm were deposited. The Co layers have different mechanisms of growth on these substrates, thus resulting in different microstructure and topography of the electrodeposited films. This leads to different GMR behavior of the multilayers in both these cases. Room temperature GMR values of 15% at low fields are obtained on ITO substrate and higher values are possible on Cu/Si substrate.