Abstract
Glass surface modification is one of the processes which changes its physical properties. Changing optical property is a significant effect of surface modification. Among the surface modification methods, laser surface modification is attractive for researchers. Here, SiO2 glass target was irradiated by Q-switched Nd:YAG laser (1064 nm) in SF6 atmospheres as well as vacuum. In this process, an Nd:YAG laser beam was focused near the glass target while the target was inserted in a chamber containing SF6 atmosphere or at vacuum condition. The surface morphology changes were investigated by scanning electron microscopy (SEM). Noticeable surface changes were observed due to laser irradiation in SF6 atmosphere. Although the absorption lines of SF6 molecule are not near the Nd:YAG laser wavelength, laser-induced breakdown spectroscopy (LIBS) showed decomposition of SF6 molecules near a glass target. The ablated fragments from the target impacted on gas molecules and decomposed them. In this work, LIBS showed that there were several fluorine ions when the target was irradiated in an SF6 atmosphere. This demonstrates SF6 molecule decomposition near the glass target by laser irradiation. The plasma temperature was ~2000 K. This temperature is much less than metallic or other gaseous materials’ plasma temperatures.
Highlights
By increasing glass microdevices’ applications, the necessary, low-priced, simple and flexible microstructuring techniques have vastly increased
We investigate surface modification on the glass surface by Q-switched Nd:YAG laser at different atmospheres
We conclude: N0,Nd:YAG/N0,ArF = 9.4, N0,Nd:YAG/N0,SHG Nd:YAG = 0.9 and N0,SHG Nd:YAG/N0,ArF = 10.9. These results show that N0 is not a linear function of temperature, we can conclude that the temperature of the irradiated area of glass surface in the Nd:YAG laser exposure is several times greater in comparison with ArF laser irradiation
Summary
By increasing glass microdevices’ applications, the necessary, low-priced, simple and flexible microstructuring techniques have vastly increased. Making precise surface microstructuring of the materials to fabricate highly integrated microdevices is one of the essential technologies of photonics. UV-transparent materials such as amorphous SiO2 glass, quartz, MgF2, CaF2 and LiF are important materials for optical device fabrication. Microfabrication of SiO2 glass as a hard and brittle optical material is difficult. Surface microstructures on glass are created by approaches based on photoresistant protection layer coating, lithography, etching and cleaning steps. Finding new techniques to decrease the time-consuming stages of the microfabrication is necessary [1]
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