Abstract
In this paper, glass/NiO/Co/Cu/Co/Ti magnetic multilayers were deposited by electron beam evaporation system. A magnetic field of a few tens Oe was applied during the deposition of some of the layers in order to pin the magnetic moments of the ferromagnetic layer to the adjacent antiferromagnetic layer. The thickness of NiO layer is 140 nm and Co/Cu/Co/Ti layers thickness is 15 nm. The dc 4-point probe technique was used to measure the magnetoresistance (MR) of the prepared samples while the magnetic field was applied in the film plane and in the current direction. The giant magnetoresistance values up to 12% and 8% achieved respectively in samples deposited in presence and absence of magnetic field.
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