Abstract
We present theoretical investigations on designing a simple double nano-slit superlens for dramatically improving imaging quality for advanced plasmonic photolithography through introducing graphene as a plasmonic integrator. It is proposed that more than 235 times enhancement of localized electric field can be assured as the graphene layer is embedded in the designed superlens. It is observed that by introducing graphene for superlensing, dominant enhancement of electric field amplitudes of interference imaging profiles can be observed at a properly designed photoresist with optimal thickness. We further show by systematically examining design parameters for the graphene-based superlens, clarifying the overall geometric and material parameter influences on the plasmonic imaging pattern characteristics. The results are attributed to the unique role of graphene participating in strong hybrid plasmonic cavity coupling modes for supporting localized electric fields of the nanoslit superlensing. This study shows proper designing of graphene-based optical superlens can potentially realize high-quality, low-cost and simple-realized nano-imaging for advanced plasmonic photolithography applications.
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