Germanium implanted photonic devices for post-fabrication trimming and programmable circuits

Abstract

We reviewed our recent developments on the post-fabrication trimming techniques and programmable photonic circuits based on germanium ion implanted silicon waveguides. Annealing of ion implanted silicon can efficiently change the refractive index. This technology has been employed to fine-tune the optical phase, and therefore the operating point of photonic devices, enabling permanent correction of optical phase error induced by fabrication variations. High accuracy phase trimming was achieved with laser annealing and a real-time feedback control system. Erasable waveguides and directional couplers were also demonstrated, which can be used to implement programmable photonic circuits with low power consumption.