Germanium dioxide: A new rutile substrate for epitaxial film growth

Abstract

Rutile compounds have exotic functional properties that can be applied for various electronic applications; however, the limited availability of epitaxial substrates has restricted the study of rutile thin films to a limited range of lattice parameters. Here, rutile GeO2 is demonstrated as a new rutile substrate with lattice parameters of a=4.398Å and c=2.863Å. Rutile GeO2 single crystals up to 4 mm in size are grown by the flux method. X-ray diffraction reveals high crystallinity with a rocking curve having a full width half-maximum of 0.0572°. After mechanical polishing, a surface roughness of less than 0.1 nm was obtained, and reflection high-energy electron diffraction shows a crystalline surface. Finally, epitaxial growth of (110)-oriented TiO2 thin films on GeO2 substrates was demonstrated using molecular beam epitaxy. Templated by rutile GeO2 substrates, our findings open the possibility of stabilizing new rutile thin films and strain states for the tuning of physical properties.