Abstract
Generic vibration and noise criteria (VC & NC) exist for semiconductor facility design purposes. This paper proposes to extend the criteria for use in nanotechnology facilities considering the higher level of sensitivity of new equipment without manufacturer's vibration criteria. Specifications are derived for air-borne and structure-borne excitation. The new criteria are referred to as 'VC-NT and NC-NT' curves and proposed to be used for the design of new laboratories and nanotechnology facilities. Three case studies are used to validate the criteria.
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