Generation of high-quality lines and arrays using nanoparticle controlling processes

Abstract

Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80nm Au lines were produced by the deposition of only 4nm Au NPs, driven by two factors—NP kinetics and collision-induced surface melting. An array of unsupported free 30–100 Ni NPs and one of 20–40nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.