Ge and Gesl Heteroepitaxy on Si(100) by MBE

Abstract

ABSTRACTWe have grown a series of Ge and graded Si1-xGex epilayers on (100)Si substrates by MBE under different conditions. The quality of the layers has been characterized by cross-sectional TEM, Rutherford backscattering/ channeling and x-ray diffraction. This work addresses the optimization of growth temperature, (300–700°C) an evaluation of compositional grading, the effect of the incorporation of strained layer superlattice dislocation filters and post growth anneal cycles. Particular attention has been paid to grading GexSi1-x, x = 0 to 1 and the growth morphology of intermediate alloy epilayers.