Gas-Phase Chemistry in Inductively Coupled Plasmas for NO Removal from Mixed Gas Systems

Abstract

Inductively coupled rf plasmas were used to investigate the removal of NO from a variety of gas mixtures. Laser-induced fluorescence and optical emission spectroscopy were employed to measure the relative gas-phase density of NO as a function of the applied rf power, gas mixture, and catalytic substrate type. In general, the overall density of NO decreases as a function of applied rf power in both NO and N(2)/O(2) plasmas, but the addition of gases such as H(2)O vapor and CH(4), as well as the presence of Au-coated substrates, significantly affects the behavior of NO in these systems. Rotational and vibrational temperatures for NO were measured using laser-induced fluorescence excitation spectra and optical emission spectra. Results show NO vibrational temperatures are about a factor of 5 higher than rotational temperatures and indicate little dependence on applied rf power, feed gas composition, or overall system pressure. Possible mechanisms for the observed changes in [NO] as well as the rotational and vibrational temperature data are addressed.