Gaseous sample introduction for the determination of silicon by ICP-AES

Abstract

The generation of volatile species of silicon as a means to introduce silicon into an inductively coupled plasma has been studied. It is based on the reaction between silicon and fluoride ions in sulfuric acid media and it was carried out using different flow injection mountings. The first mounting works with an injection of 100 μL concentrated sulfuric acid and 150 μL silicon standard solution in a continuous 0.05 mol L–1 NaF solution flow. The method shows a linear response between the intensity of emission at 251.611 nm line and the silicon concentration from 0.1 to 200 μg mL–1, with a reproducibility of 2% and a detection limit of 0.004 μg mL–1. The second mounting produces the volatile species by the reaction between two opposed aerosol flows in a home-made nebulization chamber. This chamber has a Cross-Flow and a Meinhard nebulizer at either end. A linear response ranging from 0.1 to 1000 μg mL–1 of silicon solution is obtained and the reproducibility rises to 8%.The detection limit reached is 0.02 μg mL–1. The silicon content in real water samples was determined by applying both the above-mentioned methods and a third method for reference.