Abstract

We have demonstrated a wet etching technique for fabrication of narrow ridge lasers. Precise control over etching depth and ridge width was realized by introducing an etch stop layer into a laser structure and by using two etchants with different selectivity. The 6-μm-wide ridge laser emitting at 2 μm generated continuous-wave power of 70 mW at 20°C. Single lateral mode operation was observed up to 400 mA, corresponding to 8 × Ith.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call