GaSb-based infrared detectors utilizing InAsPSb absorbers

Abstract

InPSb and InAsPSb have been investigated for use as absorber materials in GaSb-based n-type/barrier/n-type (nBn) detectors with cutoff wavelengths shorter than 4.2 μm. The growth temperature window for high-quality InPSb lattice-matched to GaSb by molecular beam epitaxy is approximately 440–460 °C. InPSb films with thicknesses greater than approximately 1 μm or films grown outside this temperature window have high densities of large defects, with films grown at lower temperatures exhibiting evidence of significant phase separation. In contrast, InAsPSb films can be grown with excellent surface morphologies and no apparent phase separation over a wide temperature range. InAsPSb samples with low-temperature photoluminescence between 3.0 and 3.4 μm and lattice mismatch of less than 1 × 10−3 have been grown, although both photoluminescence and x-ray diffraction data exhibit peak splitting indicative of compositional nonuniformity. AlAsSb-barrier nBn detectors with InPSb and InAsPSb absorbers have been fabricated. At 160 K, InPSb-absorber devices have a photocurrent responsivity edge at approximately 2.8 μm and a dark current of approximately 1.4 × 10−7 A/cm2, and InAsPSb devices with responsivity edges of 3.1–3.2 μm have a dark current of 2.3 × 10−8 A/cm2. Both InPSb and InAsPSb devices require significant reverse bias for full photocurrent collection at low temperature, suggesting the existence of an undesirable valence band energy discontinuity. The temperature dependence of dark current indicates that it is dominated by a mechanism other than generation in the undepleted absorber region.