Abstract

The effect of the gaseous medium composition on the electrically conductive properties of In2O3-Ga2O3 films obtained by halide vapor phase epitaxy has been studied. In the temperature range of 100-550oC, the In2O3-Ga2O3 films exhibit high sensitivity to H2, NH3 and possess hyphen performance and low base resistance. A qualitative mechanism for the sensitivity of In2O3-Ga2O3 films to gases is proposed. Keywords: In2O3-Ga2O3, halide vapor-phase epitaxy, gas sensitivity.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.