Abstract
The reactivity of prospective capping layer extreme ultraviolet (EUV) mirror materials with hydrocarbons, alcohols, and water is studied in the gas phase using mass spectroscopy of metal-oxide clusters. We report the results of chemistry studies for Si, Ti, Hf, Zr, and Ru metal oxide nanoclusters in which the reaction products were ionized with little or no fragmentation by 26.5 eV photons from a desk-top size 46.9 nm Ne-like Ar laser. Hf and Zr oxides are found to be much less reactive than Si or Ti oxides in the presence EUV light. Ru oxides show different chemistry and are inactive with water/alcohols, and active with saturated/unsaturated hydrocarbons. The results are relevant to the design of EUV mirror capping layers that are resistant to carbon contamination.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
