Gas‐Kinetic Temperature of Planar High‐Frequency Capacitive Discharge Plasma in N2/CO2/He Gas Mixtures

Abstract

Using methods of emission spectroscopy, we have determined the gas‐kinetic temperature fields of planar high‐frequency capacitive discharge plasma in N2/CO2/He gas mixtures depending on the excitation frequency, discharge current, pressure, and chemical composition of the mixture. It is shown that the dominant contribution to the neutral component heating in the center of the discharge chamber is made by the processes of V–T relaxation of vibrationally excited molecules N2(X1Σ, V″) and CO2(X1Σ, V″), whereas in the zones near the electrodes an important role in the heating is played, along with the V–T relaxation of the N2(X1Σ, V″) and CO2(X1Σ, V″) molecules, by the processes of deactivation of the metastable states A3Σ of the N2 molecule.