Abstract
There are ever increasing technical and business demands on the mask industry, resulting in increasing costs and cycle times. The support infrastructure continues to lack the ability to provide solutions to mask makers in a timely manner, due to its inability to recover its investment quickly. This further constraints the development resourcing necessary to stay on the Moore's Law Curve. At the same time, the mask industry has not provided a clearly focused set of demands on the equipment suppliers beyond the SIA Roadmap. This paper has taken the approach of collecting key mask metric technology requirements from the entire International SEMATECH mask community as a comparison to the SIA Roadmap requirements through to the 100 nm technology node. The results of that information identify gaps in mask-making technology by metric and process flow, prioritize the key issues, and offer potential solutions to these issues. Mask costs are addressed and challenged.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
