Abstract
The influence effect of different holes per inch on the plasma parameters and particle growth has been studied by compression between two different gap Aluminum meshes of 3 mm width, and 8 holes per inch (8 h/in) and 0.3 mm width and 20 holes per inch (20 h/in) at very low pressure. The perforated aluminum mesh with small diameter holes 20 h/in shows a better glow discharge stabilization than mesh with large diameter holes 8 h/in. For both 20 h/in and 8 h/in, sharp axial decrements for electron Temperature (Te), where Te decreased from 5.2 to 3.8 eV for 8 h/in, from 2.75 to 1.8 eV for 20 h/in. In contrast sharp axial increments for electron density (Ne), whereas Ne increased from 0.9 × 109 to 20 × 109 cm-3 for 8 h/in and from 8 × 109 to 42 × 109 cm-3 for 20 h/in. Silicon wafer [100] was exposed directly behind the meshes to realize nano-particle growth in sputtering discharge, where there are two different particles shapes: spherical shape particles produced by 20 h/in, and filamentary-shaped fractal particles formed by 8 h/in. The particle radius growth for 20 h/in was in the range of 4.67 - 301 nm during exposure time 40 - 95 min, and for 8 h/in were in the range of 9.2 - 28.8 nm during exposure time 60 - 95 min.
Highlights
In the recent years, a gas discharge plasma application has rapidly unlimited due to the great chemical freedom offered by the non-equilibrium aspects of the plasma
The perforated aluminum, copper, and stainless steel were studied in many articles, thorough production of glow discharge by using a combination of fine wire mesh and perforated of different materials as electrodes were investigated
An ultra low frequency (ULF) power supply of one KHz frequency, few hundred Volts and 50 - 100 mA currents to produce ultra low frequency of plasma (ULFP) discharge current, where the plasma parameters were measured using double Langmuir probe at very low gas pressures 0.6 mbar, and the distances between the two circular electrodes were separated by small distance 5 mm and were placed normal to the formed plasma, where the interested regions over the perforated aluminum (Al) mesh represent the power electrode with different fine holes, which introduced as a series-parallel arrangement of small holes with sharp edges
Summary
A gas discharge plasma application has rapidly unlimited due to the great chemical freedom offered by the non-equilibrium aspects of the plasma. (2015) Gap Mesh Wire Control on Nano-Particles Growth. The perforated aluminum, copper, and stainless steel were studied in many articles, thorough production of glow discharge by using a combination of fine wire mesh and perforated of different materials as electrodes were investigated. Coating process through the particle growth in plasma interaction plays vital roles in numerous observed phenomena in the space environment, whose scope in the industrial laboratory has grown rapidly in recent times to include such diverse areas as materials processing and microelectronics [7]. The discharge gap represented by perforated aluminum mesh with different fine holes as a power electrode is introduced. The basic idea is that the perforated meshes (consists of a series-parallel arrangement of small holes with sharp edges) have an important factor on the plasma parameters and the particle growth mechanisms. The growth of particles formed due to sputtering discharge has been carried out and investigated, using different meshes; mesh with small hole width represented by 20 fine holes per inch (20 h/in) and mesh with large hole width represented by 8 fine holes per inch (8 h/in)
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