GaN barrier layer dependence of critical thickness in GaInN/GaN superlattice on GaN characterized by in situ X-ray diffraction

Abstract

We investigated the critical thickness dependence on the GaN barrier layer thickness in a GaInN/GaN superlattice (SL). The characterization was done by combining an in situ X-ray diffraction (XRD) system attached to a metalorganic vapor phase epitaxy rector and ex situ analyses such as scanning electron microscopy and transmission electron microscopy. The critical thickness required for the introduction of a + c-type misfit dislocations (MDs) in the GaInN/GaN SL was determined by analyzing the full width at half maximum of the in situ XRD spectrum from a GaInN/GaN SL as a function of SL periods, and we successfully found the critical thicknesses of specific different SLs.