Abstract
Electrochemical deposition of cuprous oxide (Cu2O) thin films on tin-oxide-coated glass and copper substrates by cathodic reduction of alkaline cupric lactate solution has been investigated between 60 and 80°C. Deposition kinetics of cuprous oxide thin films were studied and the parameters limit for the deposition of the films were determined. Structure of the deposited film is simple cubic with a preferential orientation of (200). Optical absorption studies reveal 1.99eV for band gap and optical constants (n,k) are evaluated. Electrical resistivity studies are carried out in the temperature range 27–330°C. The effect of annealing on the resistivity of Cu2O films are also studied and the results are discussed.
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