Gallium Nitride: Charge Neutrality Level and Interfaces

Abstract

An analysis of experimental data revealed the dependence of the metal/n-GaN GaN(0001) barrier height on the metal work function, as predicted by the model that takes into account the charge neutrality level of the semiconductor. In case of the metal/p-GaN(Mg) barriers, significant scatter of the corresponding experimental data is observed and pinning of the near-surface Fermi level near E v + 2.5 eV takes place in most structures, which is due to the influence of high density of interface defect states formed during the process of the GaN doping by Mg impurity.