Fundamentals of pulsed laser deposition, advanced developments and implementation of combinatorial material synthesis, and its application to the growth of Ga2O3 and related alloys

Abstract

Pulsed laser deposition (PLD) is a physical vapor deposition technique that, due to its versatility, is employed for the growth of a wide array of functional materials, including dielectrics, semiconductors, superconductors, complex oxides, metals, micro- and nanostructures, and even organic materials such as polymers. Depositions can be performed with background pressures ranging from ultra-high vacuum to approximately 100mbar. The development of PLD can be traced back to the discovery of high-temperature ceramic superconductors. Subsequently, a multitude of adaptations and extensions to the method have been introduced, thereby further enhancing its flexibility and expanding its potential applications. One such area is combinatorial materials science, which enables the high-throughput experimental screening of physical properties within spatially addressable materials libraries. A variety of PLD adaptations facilitate the creation of such libraries through combinatorial material synthesis. This chapter provides an overview of the fundamental principles of PLD, encompassing general equipment technology and target fabrication, while also delineating pertinent methodological advancements. In conclusion, this chapter reviews the application of PLD for accelerated materials discovery in combinatorial materials science and recent developments towards area-selective deposition.