Abstract
The functional microscopy tip was fabricated by an electric conductive nanowire (NW). Single crystalline nickel silicide (NiSi) NW grown by plasma-enhanced chemical vapor deposition has an excellent electrical conductivity. On behalf of the advantages in tiny size and conductivity of NiSi NW, it was utilized as a nanoscale probe. Dielectrophoretic method was applied to position the NW. The NiSi NW containing solution was dropped in an ac electric field applying system to align the NiSi NW on a Si cantilever. The fabricated NiSi NW-sitting functional microscopy tip obtained the information of topography and electrical signals from a nanoscale structure. It shows the high potential of nanoscale microscopy tip fabrication at reduced processing steps.
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