Abstract
Recently, we developed an RF plasma mist deposition technique in ambient atmosphere. Indium tin oxide films have been coated on soda—lime—silicate and fused silica glass substrates, at deposition temperatures ranging from 400 to 750°C. As-deposited films are uniform and homogeneous as revealed by scanning electron microscopy, atomic force microscopy and energy dispersive spectroscopy, X-ray diffraction indicated that either indium oxide (In 2O 3) or tin oxide (SnO 2) is formed depending on the indium-to-tin ratio (In:Sn). Average sizes of crystallites in the films are between 6 and 35 nm. Furthermore, as-deposited films are nearly 100% transparent in the visible range and the maximum conductivity occurs near In:Sn ratio of 9:1. Other material properties, such as the optical absorption edge and lattice parameters are also dependent on the In:Sn ratio.
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