Abstract
In this work, we present a full band Monte Carlo simulation of the effects of dislocation scattering on the performance of a 0.25 μm AlGaN/GaN HEMT (high electron mobility transistor). We performed a full characterization of the device and validated the simulation results with experimental data (Lee et al. in IEEE Electron. Dev. Lett. 24:613–615, [2003]). Here we show a study of the DC device performance as a function of the density of thread dislocations.
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