Abstract
The precise measurement of the deposition rate is an essential part of successful fabrication of thin films, both organic and inorganic ones. Established methods using quartz oscillators are known to possess a variety of disadvantages, foremost a very limited lifetime. Here, we report on a novel measurement technique for the deposition rate of organic thin films, based on Fourier-transform infrared spectroscopy. Different organic species have been uniquely identified with similar accuracy compared to standard methods. The lifetime of the system can be vastly extended compared to quartz oscillators and multiple organic species can be detected simultaneously, allowing for co-deposition of materials with only one detector necessary. This method can be used for both quantitative as well as qualitative analysis of deposition or doping processes.
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