Abstract
Abstract Using the Hopkins algorithm, expressions are derived for the intensity patterns, in both the Fresnel and far-field regions, associated with the diffraction of a plane-wave elliptical Gaussian beam truncated by an elliptical aperture. This is accomplished by evaluating the diffraction integral subject to the Fresnel approximation. Numerical results are presented that indicate how the truncation parameter affects the side-lobe level in the Fresnel and far-field regions.
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