Abstract

A new method of obtaining a high-density plasma (n ∼ nc0) in a resonant cavity is described. The method is to increase the frequency of the exciting microwave power source by as much as ∼ 10% while keeping the input microwave power constant and maintaining an impedance match between the source and the cavity. Density increases of the order of seven-fold have been obtained in this way. The result is explained mainly on the basis that the power loss in the impedance-matching network decreases as the excitation frequency is increased.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.