Abstract
Free standing microstructures become necessary when transparent materials are unavailable as supporting layers in transmission components. In this work we use electron beam lithography and reactive ion etching in crystalline silicon membranes to fabricate open stencil patterns for two novel applications: transmission reticles containing resolution test patterns for projection soft x-ray lithography at λ=36 nm; and a Fresnel zone plate for focusing beams of cold neutral atoms. Various schemes are described for making components with minimum zone plate feature sizes down to 0.23 μm and grating features below 0.1 μm. We also report on several materials and processing issues which limit feature sizes and distortions in these microstructures.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
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