Abstract

UV-based advanced oxidation processes (UV-AOPs) have been recommended to disinfect wastewater treatment plant (WWTP) effluents to control the dissemination of antibiotic resistance, but the mechanism of intracellular antibiotic resistance genes (i-ARGs) degradation by UV-AOPs is still poorly understood. Here we compared the efficacies of UV, UV/H2O2, and UV/PDS in degrading seven i-ARGs carried by a multi-drug resistant P. putida MX-2 isolated from sewage sludge and investigated the roles of free radicals and UV irradiation in degrading the carried i-ARGs in UV-AOPs. The results suggested that although UV/H2O2 and UV/PDS were only slightly superior to UV to inactivate P. putida MX-2, they significantly promoted the degradation of i-ARGs. The generated free radicals mainly reacted with the bacterial extracellular polymeric substances (EPS), increased the cell membrane permeability of bacteria, and consequently facilitated UV irradiation enter into the intracellular environment to damage the i-ARGs, thus enhancing their degradation during UV-AOPs processes. Our findings suggested that the removal of bacterial EPS by free radicals greatly contributed to the degradation of i-ARGs by UV irradiation in UV-AOPs, and more efficient approaches that are capable of removing EPS should be further developed to effectively control the dissemination of antibiotic resistance by UV treatment of wastewater effluent.

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