Abstract
AbstractThin films of polyetheretherketone (PEEK) were ion bombarded using a plasma immersion ion implantation (PIII) process in Ar and CH4/O2 plasmas. Free radicals generated by the treatment were detected using electron spin resonance (ESR) spectroscopy. Several types of radicals were observed after the Ar and CH4/O2 PIII treatment, including carbon‐centred (alkyl) and oxygen‐centred radicals. A higher density of radicals was found after CH4/O2 treatment than after Ar treatment, largely because of an increase in oxygen radicals. The increase in radical intensity was attributed partly to additional radicals contained in a nano‐layer deposited by the CH4/O2 PIII treatment. Ar PIII treatment is believed to generate oxygen‐containing radicals as a result of reactions with oxygen in the environment. A strong correlation was observed between the free radical density and the autohesive bonding strength developed between two treated PEEK surfaces.magnified image
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.