Year-end Sale % OFF 
Abstract
ABSTRACTPromoting both high functional group preservation and high deposition rates is a major challenge in plasma deposition. This study explores a dynamic method using nanosecond pulsed plasma discharges to polymerize thin liquid layers of 2‐hydroxyethyl methacrylate (HEMA). The influence of plasma pulse frequency (200 ns) and liquid layer thickness on chemical structure retention, polymeric growth, and thin film growth rate is examined. High‐resolution mass spectrometry (HRMS) highlights that plasma curing of liquid monomer layers achieves significantly better chemical structure preservation and polymeric growth, along with deposition rates an order of magnitude higher than traditional vapour‐phase methods. This work provides valuable insights and guidelines for plasma‐induced free‐radical polymerization of liquid layers into functional thin solid films.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
